Germany – Miscellaneous general and special-purpose machinery – Clustertool for Ion Beam Etching of 300mm wafers
closedFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. · 10342
Value
unstated
Published
19 Feb 2026
Deadline
—
Type
opportunity
42900000 · Industrial machineryDED21
Description
The tender item is an ion beam etching process tool to be used for 300mm wafer fabrication at the FRAUNHOFER IPMS. The systems will be used for the processing of CMOS wafers in a cleanroom class 1000 (approximately class 6 EN ISO 14644-1) production environment. Therefore, it is necessary to fulfill require-ments regarding metal contamination and particle generation compatible with industry standards.
Key facts
- Procedure
- neg-w-call
- Submit via
- http://www.deutsche-evergabe.de/dashboards/dashboard_off/bd4dfee5-1838-40b4-a81a-06d8f79ef81c
- Contact
- einkauf@iis.fraunhofer.de
- Contract period
- 1 Dec 2026 → 31 Dec 2026
- Category
- supplies
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Provenance
- Source
- ted-eu
- Notice id
- 117594-2026
- First seen
- 21 Aug 2026
- Last updated
- 29 Aug 2026
Licence EU reuse — Commission Decision 2011/833/EU ↗
Source: TED — Tenders Electronic Daily (ted.europa.eu), © European Union, reused under Commission Decision 2011/833/EU.
View at source ↗
GET /api/v1/tenders/b071188a-c1fb-4c64-987d-ce87cedb5d48The source notice is authoritative — verify deadlines and documents there before bidding.